MW / Vacuum Motion

Precision motion engineered for vacuum environments.

MW vacuum stages are designed to maintain controlled, repeatable motion where conventional motion systems must meet the additional demands of vacuum operation.

Motion performance does not stop at the chamber door

Vacuum applications place additional demands on materials, lubrication, thermal behavior, contamination control, and mechanical design. MW vacuum stages are developed with these system-level requirements in mind, providing a motion platform designed for integration into demanding vacuum equipment.

Vacuum-compatible design

Materials and mechanical architecture can be configured around the requirements of vacuum-based systems.

Controlled positioning

Precision motion supports scanning, alignment, inspection, handling, and positioning inside vacuum environments.

Built for integration

Designed to become part of semiconductor, research, inspection, and advanced vacuum equipment.

Engineered around the environment

MW vacuum stages are suited to semiconductor processing, wafer inspection, thin-film research, vacuum metrology, scientific instrumentation, and other controlled environments.

Designing motion for a vacuum environment? Share your chamber, travel, load, and integration requirements with MW.

Discuss Your Motion Requirements →